Manufacturing, Mechanical, and Electrical Engineering Design Services

Expert Manufacturing, Mechanical, and Electrical Engineering Design Services. Unleash Innovation and Precision in Every Detail. Elevate Your Project with our Collaborative Expertise.

Hardware Installation Service

  • Assemble and proceed to test for product installation
  • Provide global installation service
  • Manage the output schedule
  • Escalate key issues to stakeholders
  • First-line troubleshooting skill
  • Drive product quality and continuous improvement

High Volume Production Manpower

  1. We provide talents with different semiconductor equipment vendors’ experience in system installation/customer service/module assembly, etc., and also with domain know-how.
  2. Can be trained easily and provide more troubleshooting service in a short time.
  3. High quality/Low cost for saving company costs regarding hiring, training, and time.
  4. Employee manning review, movement, and succession planning for different module assemblies support will be easier

Field SITE Customer Service Manpower

  1. Provide manpower with experience in Customer Service/ Field Application/ Prevention Maintenance /Corrective Maintenance
  2. Help customers to improve the wafer fabrication process
  3. Monitoring production status and providing feedback to customers regarding issues’ root causes, containment, and improvement actions.

Electrical Engineering Design

  • DW creation
  • SMPS: AC- DC, DC- DC
  • Schematics & PCB Layout
  • Obsolescence Management
  • Field failure analysis
  • Module Conversion
  • Design of ultra low noise including power supply
  • Analysis, Simulation & improvement of existing circuits
  • DFM/DFT implementation
  • Proto build

Electrical Capability

Mechanical Design

  • Concept Generation
  • EME- Design & Development- Cabinet
  • Cable & Bundle Routing
  • Detail Engineering
  • Engineering Analysis/ Simulation
  • Mechanical Testing Solutions
  • Pre-Installation docs/ TPD preparations
  • Document Preparation
  • BoM Management
  • Production issues/Support
  • Proto build

Mechanical Engineering Capability

Contamination Control & Cleanroom Cleaning Service

  • Cleanroom cleaning
  • Cleanroom validation measurement
  • Airborne particle counter measurement
  • Surface particle counter measurement
  • Surfscan Sp1 measurement
  • PDM measurement
  • Manufacturing defect analysis
  • Cleanroom contamination Risk Control

Surface Particle Counter Measurement

Particle Guard
  • Exposure of clean (8-inch) wafers (to process/ activities/ environment).
  • Measure the number and size of added particles on the wafer
  • Measurement tool: Particle Guard (Surface particle counter/ ACP)
  • – Light scattering
    – Spot size: 24 mm2
    – Detection range: 0,5 µm – 6 mm
  • Measurement surface 25 – 30 cm2 (100 measurement spots/ wafer)
  • Measurement data converted into the number of: added particles/ dm2 or added particles/ dm2/ hour
Disadvantages:
  • Manual scanning of witness plate (risk of adding particles, time)
  • Contact measurement (risk of adding/ removing/ replacing particles)
  • Moderate accuracy for particle sizes 0,5 – 50 µm
 
PartSens
  • numbers & sizes (≥ 3µm)
  • Measurement spot: 32 mm2 (6.53 x 4.90 mm2)
  • Non metallic particles 2µm – >3000µm
  • Metallic Particles 25µm – >3000µm
  • Fiber 50µm – >3000µm
  • Measurement tool: PartSens (Surface particle counter/ Intechno)
PMC
  • Black sticky PU elastomer: Ø 30 mm
  • Sample area PMC:  2 cm2 (Ø 17 mm = 2.27cm2)
  • Pick-up efficiency: 93% +/- 5% (for particle sizes ≥ 2µm)
  • Effective for particle size ≥ 0.5 µm

PDM Measurement

More accurate large particle detection with less diffraction impact:

  • Exposure of clean glass plates (49cm2) to process/ activities
  • Measure nr and size of added particles on wafer, after exposure
  • Type: PDM
  • Manufacturer: SAC
  • Measurement area: 49 cm2
  • Detection range: 10µm -12000µm

Manufacturing Defect Analysis

Materials analysis

  • TEM, STEM (EDS & EELS):

– TEM analysis for EUV PR & low-k
– Algorithm for CD measurements
– Self-development ALD

  • FIB & PFIB
  • Less curtain effect for FIB/PFIB
  • SEM
  • Energy-filter SEM imaging

Surface analysis

  • New SIMS chamber, low elemental
    detection limit
  • Angle-resolved XPS for super-thin film analysis
  • Biggest AFM sample holder, 12” wafer-size
  • Special method to reduce water influence during FTIR analysis & fully-equipped database for comparison
Failure analysis
  • The best spatial resolution of 3D X-ray & TDR
  • The highest sensitivity of LIT & HT-InGaAs
  • Nanoprobe for < 5 nm node EBIC, EBAC, and EBIRCH for advanced node
  • High-quality parallel lapping

Cleanroom Contamination Risk control

Using HACCP(Hazard Analysis Control Critical Point) & FMEA(Failure Mode Evaluation Analysis) as flow evaluation mode:

Step 1: Identify the source and route of contamination
Step 2: Risk Assessment and Source Control
Step 3: Establish an effective monitoring program
Step 4: System Validation and Re-evaluation
Step 5: Documentation of the Monitoring System
Step 6: Education and Training for Personnel